Module 6 None-Metallic Materials Objective Four Flashcards
Ceramics
inorganic compounds where the primary bonds are ionic and/or covalent in a 3D structure
Ionically Bonded Ceramics
complex compounds of a metal with a non-metal
Covalent Ceramics
compounds of Two non-metals, or just pure elements
Structures of Ceramics: Glasses
Silica based with other compound additions to decrease the melting range and other special properties.
Easily molded, but low creep resistance
Structures of Ceramics: Vitreous Ceramics
made from clays which are formed in a wet plastic state, and then dried and fried. Held together by a glassy phase based on silica
Structures of Ceramics: High performance Ceramics
cutting tools, dies, wear resistant parts
Engineering Ceramics: Oxides
used as insulators, abrasive and wear parts, ballistic vests.
Includes aluminia Al2O3 Zirconia ZrO2 Silica SiO2 etc
Engineering Ceramics: Carbides
Very high hardness, used in abrasives, cutting tools and wear resistant parts
Carbides of tungsten, chromium, silicon, boron, titantium, vanadium
Engineering Ceramics: Nitrides
used for wear-resistant parts and specialized electronic devices, extremely thermal shock resistant, so they’re used for gas turbines and rocket engines
Engineering Ceramics: Intermetallics
used in wear coatings, two metals together results in a different crystal structure from the constituents, resulting in special properties NiAl
Engineering Ceramics: Diamond
highest naturally occurring hardness. Used in cutting tools, dies and abrasives
Physical Vapour Deposition
when the substrate is placed in a vacuum chamber and the coating material is evaporated from a heated container. all surfaces in the line of sight are coated with the vapour (deposition)
DC sputtering Techniques
a part is place in a vacuum with a small amount of argon. Then a high voltage DC current creates plasma between the part (anode) and the coating material (cathode), which sputters off its atoms through the plasma to coat the part
Ion Plating
combines PVD and DC sputtering. The coating material is evaporated, then ionized by the plasma using an electron beam gun. The ionized ceramic bombards the substrate
Chemical Vapour Deposition (CVD)
involves the deposition of coating material vapour on a preheated substrate. Does not require line of sight