Chapter 10 Oxidation

Question 1

Oxide Film

Answer 1

Uses of Oxide Film

1. Device Protection and Isolation
2. Surface Passivation
3. Gate Oxide Dielectric
4. Dopant Barrier
5. Dielectric Between Metal Layers

Question 2

Nature of Oxide Film

Answer 2

Typical thermal oxidation temp: 750-1100C
Atomic structure: a silicon atom surrounded by 4 oxygen atoms.
Native Oxide: up 40A at 25C but nonuniform thickness -> usually considered as contaminant.

Question 3

Field Oxide Layer (surface passivation)

Answer 3

Field oxide isolates active regions from each other