TEM Flashcards
TEM
TEM is an analytical tool that allows detailed investigation of the morphology,structure, and local chemistry of metals, ceramics, polymers, biological materials and minerals. It also enables the investigation of crystal structures,
crystallographic orientations through electron diffraction, as well as second phase, precipitates and contaminants distribution by x-ray and electron-energy analysis
TEM overview
-Gun emits electrons
-Magnetic (and electric) field control path of electrons
-Electromagnetic lens which focuses the electrons into a very fine beam
-Electrons scatter when they pass through thin sections of a specimen
-Transmitted electrons (those that do not scatter) are used to produce image
-Denser regions in specimen, scatter more electrons and appear darker
-Spatial resolution normally achievable @ 200KeV: ~1Å
-The higher the accelerating voltage, the smaller the wavelength of the
electrons and the higher the possible achievable resolution.
Source Types
- Tungsten
– Wire filament - Lab6
– Lanthanum hexaboride
crystal - Field Emission Gun
– Tungsten tip
– Thermionic (Schotkky) and Cold
Field emission Guns
Allows for emission of electrons
from fine tip via charge differential
of tip and anodes:
* Brighter
* More coherent source
* High signal-to-noise
ratio and spatial resolution
* Increased emitter life
* Atomic diameter point source is
future of FE guns
Accelerating voltage
- accelerating voltages range from 60 kV to 200 kV.
- Higher accelerating voltages give higher resolution, but less
contrast. High accelerating voltages can also result in greater
specimen damage. - For these reasons, studies of biological samples tend to
employ low accelerating voltages (60 kV to 100 kV), while
studies of inorganic materials, which often require higher
resolution, usually employ an accelerating voltage of 200 kV.
LENSES:
-Electromagnetic lenses
-Condenser lens
-Objective lens
-Intermediate lens
-Projector lens
Electromagnetic lenses
-All modern TEMs use electromagnetic lenses. These consist of a coil of copper wires inside iron pole pieces.
-A current through the coils creates a magnetic field, symbolized by red lines in the diagram on the left. This field acts as a convex lens, bringing off axis rays back to focus. Focal
length can be changed by changing the strength of the current.
Electron optics elements
–Lense: Focus (or defocus) the beam on the specimen and
change the magnification.
–Deflection coil: Shift or tilt the beam.
–Stigmators: Correct the lenses. Ideally lenses are round and
symmetrical but in practice there are small deviation which is
corrected by the stigmators.
Condenser lens
–Illuminates the specimen.
–Controls the diameter of the beam.
–Relatively weak lens.
–Longer focal length than objective or protector lens.
–May bring electron beam into focus directly upon specimen, above the specimen (over focusing) or below the specimen (under focusing).
Objective lens
–Strong lens.
–Most important lens
–Forms initial image further magnified by other lenses
–Responsible for focus
–Highly concentrated magnetic field and short focal length. Causes electron beam, which has passed through specimen, to focus at a point a few nanometers below
specimen.
–The larger the aperture used the more phase contrast
–The smaller the aperture the more
aperture contrast
Intermediate lens
–The first intermediate lens magnifies the initial image that is
formed by the objective lens.
–The lens can be focused on:
Initial image formed by the objective lens, or Diffraction pattern formed in the back focal plane of the objective lens.
–This determines whether the viewing screen of the microscope
shows a diffraction pattern or an image. You may switch focus between the image and the back focal plane
Projector lens
-The projector lens magnifies the
image magnified by the intermediate
lens, and then forms the final image
on the fluorescent screen or the
detector.
-increase current = spreads beam =
higher magnification)
Apertures
–The condenser aperture controls the fraction of the beam which is allowed to hit the specimen. It therefore helps to control the intensity of illumination.
–The objective aperture selects which beams in the diffraction pattern contribute to the image, thus producing diffraction contrast.
–The selected area aperture is used to selected a region of the specimen from which a diffraction pattern is obtained.
Bright field
–An aperture only allows unscattered electrons to proceed and form the image,the scattered ones are blocked. Dark regions are strongly diffracting or dispersing the light. This is the most common imaging
technique.
–Contrast in an image is created by differences in diffraction. By inserting an aperture in
the back focal plane, an image can be produced with these transmitted electrons.
Dark field
In dark field (DF) images, the
direct beam is blocked by the
aperture while one or more
diffracted beams are allowed to
pass the objective aperture. Since
diffracted beams have strongly
interacted with the specimen, very
useful information is present in DF
images, e.g., about planar defects,
stacking faults or particle size.