Optical- Optical Fibre Manufacture Flashcards
Improving conventional routes
Melting using highest purity materials. Control oxidation state of impurities to minimise their effect (Fe3+ better then Fe2+). Techniques such as skull melting (use inductive heating of material contained within cool skull of similar composition minimising refractory corrosion contamination). Avoid contamination via gaseous state (by using inductive heating)
Double crucible technique
Molten core fed into crucible within molten cladding in outer crucible. See page 6 lecture 7 for diagram. Can make narrow-ish core but monomode difficult to produce
Main points of chemical vapour deposition (CVD) techniques
Use chemicals based on liquids which are then further purified during processing by distillation (impurities, already at low concentrations, are emu has less volatile). All reactions take place in vapour state. Problem of contamination by reaction vessel reduced by building up layers on already high quality substrate (skull melting).
Chemistry of CVD technique
Start with high purity liquid SiCl4 and distill. Vapour mixed with O2 between 1300 and 1600C to produce SiO2 and 2Cl2. Results in deposition of fine SiO2 soot (0.1μm) inside reaction vessel, normally semiconductor grade SiO2 tubing. Cl2 produced helps eliminate OH in finished fibre. If O2 supply has 4ppm of H2O then final fibre has 1ppb OH. In hot zone created by flame, soot is sintered to dense layer on inside of reaction tube. About 0.5g/min deposition. Finished preform about 1kg so takes more than 1 day.
Limiting factors in CVD process
Reaction rates and rate of soot deposition. Gas flow limits rate of delivery and must give sufficient residence time for reaction.
Diagram of CVD process
Page 10 lecture 7
Modified chemical vapour deposition MCVD
Gas concentrations and temperature ps high compared with electronics industry so: nucleation of soot is in gas phase, does not occur homogeneously at surface (formation of single crystal silicon for semiconductor technologies where structure is built up atom by atom).
Diagram of glassmaker’s lathe
Page 12 lecture 7
How do vapour pressures of potential impurities vary with temperature?
Vapour pressure decreases with increasing 1000/T see page 13
Typical preform dimensions
Diameter of 25mm and is metre long
How to modify refractive index of silica glass
Add other volatile species in to gas phase in controlled amounts. Can make core-clad structure with defined r.i profile can be built up in layers (typically about 80 layers to make preform)
Examples of refractive index modifiers and their effect
GeCl4 (l) increases r.i (G is dopant)
POCl3 (l) increases r.i (P is dopant)
BCl3 (g) or BBr3 (l) decreases r.i (B is dopant)
SiF4 (g) or CCl2F2 (g) decreases r.i (F is dopant)
Gas system for adding refractive index modifiers
See page 16 lecture 7
Why is compositional control in MCVD important?
Ensure a reproducible numerical aperture
Ensure material and waveguide dispersion are balanced at the intended operating wavelength
Hole in preform
There is hole in core of preform since gap must be left for gas transport when depositing the last layer. Hole must be eliminated by collapse after the rod is finished