Digital IC Design Flashcards
What are some ways of storing information
Magnetic media - optical media - paper tapes - semiconductor memories
What is a semiconductor
An electronic circuit that can store information
Three types of Sequential access memory
Serial storage, FIFO, LIFO
Types of ROM and what type is it?
Non volatile
ROM - Data built in fabrication
PROM - All data 1 with fuses that blow to crate 0 - can be written once
Types of RWM/RAM?
And what type is it?
Voltatile
Static - basic cell is flip flop, low density but fast
Dynamic - Capacitor, high dencity but slow
Cells equation:
1 Mbit = 2^20 cells -> 2^10 columns/rows
EPROM?
Special transistors used at each row/column intersection. This transistor has 2 gates.
* When there is no initial charge in G2 and the voltage in G1 increases, voltage in G2
also increases due to capacitive effect. This effectively raises the threshold voltage of
the MOSFET but the channel can still be formed when G1=+5v.
* If G2 is negatively charged, no channel can be formed by G1=+5v anymore. Thus the
transistor remains permanently off as long as G2 is not discharged.
* G2 can be negatively charged by connecting G1 and DRAIN to +25v and the
SOURCE grounded. As G2 is surrounded by insulators, it will retain the charge for a
very long time.
* G2 can be discharged again by exposing it to ultraviolet light. UV generates electronhole pairs in SiO2 which allows the stored charges to leak off.
* Entire memory must be erased before reprogramming
EEPROM?
Same as EPROM except that the insulator thickness is greatly reduced.
* When 20v is applied to G1 (control gate) while VD=0, electrons tunnel from n+
region to G2 (floating gate). This raises the threshold to 10v and the transistor
is effectively off.
* To discharge G2, zero volt is applied to G1 and 20v to VD.
* We may selectively erase blocks of EEPROM cells
What’s an internal memory architecture?COPY TO OTHER FOLDER
Each cell stores one bit
Memory cells are arranged in an array format
The array is symmetric
By selecting appropriate row and column we can access any cell
When is n N-Type mosftet produced and what is it’s structure?COPY TO OTHER FOLDER
N-type mosftet is produced when a bit of green NDiff track is crossed by a bit of red polysilicon - the NDiff is on either side of the polysilicon and froms the drain/souurce n+ for strongly doped with most electrons which reside in the two green NDiff tracks. The P substrate is lightly doped and made of a layer of silicon dioxide
What are the two important dimensions of the N-channel mosfet?COPY TO OTHER FOLDER
Current flow from Drain -> Source -> Under gate(Red sili)
It is length L of the transistor and the width W across the gate to change performance you alter these values
What happens if you connect one end of the n diff to ground and the other to a variable voltage VDS in a MOSFET?COPY TO OTHER FOLDER
We assume a small Vds of 1V and say that VGs = 0
The N-type in contact with the P-type form a diode from gate to source.
No current flows
What happens once the layers are grown in the MOSFET?COPY TO OTHER FOLDER
Rest of polyslicon and oxide are etched away, the N type dopans are implanted in the regions either syde of the ply which become the N type, the bit bellow the red sylicon(gate) is protected so it’s not N type
Summarise mosfets?COPY TO OTHER FOLDER
If the Vgs gate signal is above the voltage threshold Vt, the device is on and the current flows, otherwise it is off.
When the gate voltage VGs = 0 drain to channel is revsersed biased so there is no path from D to S
When Vgs > 0V and <vT electrons are repelled
Equations for mosfet COPY TO OTHER FOLDER
Current is the rate of change of charge I = dQ/dT
so for a mosfter Ids = ChargeInChanel/TransitTime
TO GET TRANSIT TIME:
transitTime = Length/Velocity
Velocity = mobilty(u) * electricfield
Electricfield = VDs/L
So….
TRANSIT TIME = L^2/uVds
TO GET CHARGE IN CHANNEL:
Q = Cg *(VGS - Vchann - Vt)
Cg = eWL/D
so to bring it together
Ids = uew/LD[(VGS-VT)VDS - V^2ds/2]
OR
Ids = b[VGS-VT]Vds - V^Ds/2] (CCAN IGNORE vDS2/2 IF IT IS SMALL)